A layer of zinc oxide(ZnO)micro-grid was deposited on the surface of ZnO film using the DC reactive magnetron sputtering method and the micro-sphere lithography technique on glass substrates.Samples of this layer were characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM),atomic force microscopy(AFM),and ultraviolet-visible light spectroscopy.X-ray diffraction showed the high crystallinity of ZnO film and the regular arrangement of the micro-grid.The microgrid ZnO has a lower specular reflection and a higher diffuse reflection,allowing incident light to reflect two or three times to enhance the usage of light.Photocatalytic degradation experiments on methylene blue using both ZnO micro-grid and ordinary film showed that the ZnO micro-grid has better photocatalytic properties than ordinary film.The ZnO micro-grid enhanced the photocatalytic efficiency of ZnO film by 28%with a degradation time of 300 min.
Chunzhi LIWenwen WANGJunying ZHANGHailing ZHUWeiwei ZHANGTianmin WANG
Aiming at reducing the recombination of photo-induced carriers in semiconductor photocatalytic process, we prepared TiO2 thin film with its surface modified by a connected Cu micro-grid via a microsphere lithography strategy, which showed higher photocatalytic activity than the pure TiO2 film. The improvement of photocatalytic activity of Cu micro-grid to the TiO2 film is due to the charge carrier separation and electron transfer by the conducting metal grid. The photocatalytic activity was improved as metal loading increased, which obtained the best performance at a certain loading amount, and then decreased at higher loading amount. This phenomenon was attributed to the metal’s bulk effect which could be explained by the relationship between the energetic positions and the metal cluster size.
ZHU HaiLing1, ZHANG JunYing1, WANG TianMin1, WANG LiuGang1, LAN Xiang1 & HUANG BaiBiao2 1 School of Science, Beihang University, Beijing 100191, China
