The temperature-driven spin reorientation transition of magnetron sputtered Ni/Si （111） systems has been studied. The relationship between ac initial susceptibility and temperature of nickel films with different thicknesses shows that the magnetization orientation changes from in-plane to out-of-plane with the increase of temperature. The temperature dependence of mugnetoelastic, magneto-crystalline, and magnetostatic anisotropies determines the direction of the reorientation transition. The temperature-driven spin reorientation transition is supported by Hall coefficient measurements which show that its temperature dependence is similar to that of susceptibility.
