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湖北省自然科学基金(2004ABA082)

作品数:9 被引量:11H指数:2
相关作者:李美亚赵兴中徐文广李少珍刘军更多>>
相关机构:武汉大学华中科技大学三峡大学更多>>
发文基金:湖北省自然科学基金教育部重点实验室基金国家重点基础研究发展计划更多>>
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Si基铁电Bi_(3·15)Nd_(0·85)Ti_3O_(12)多层薄膜的一致取向生长和性能的研究被引量:3
2006年
采用脉冲激光沉积(PLD)技术,利用LSCO/CeO2/YSZ多异质缓冲层,在Si(100)基片上成功地制备了c轴一致取向的Bi_(3·15)Nd_(0·85)Ti_3O_(12)(BNT)铁电薄膜.利用X射线衍射(XRD)和扫描电镜(SEM)分析测定了薄膜的相结构、取向和形貌特征,考察了沉积温度和氧分压对BNT薄膜微结构、取向和形貌的影响,确定了BNT薄膜的最佳沉积条件.对在优化的条件下制备得到的BNT薄膜的C-V曲线测试得到了典型的蝴蝶形曲线,表明该薄膜具有较好的电极化反转存储特性.最后讨论了BNT薄膜铁电性能与薄膜取向的相关性.
李少珍李美亚徐文广魏建华赵兴中
关键词:BI3.15ND0.85TI3O12铁电薄膜脉冲激光沉积
Ferroelectric properties of Bi_4Zr_(0.5)Ti_(2.5)O_(12) thin films prepared on LaNiO_3 bottom electrode by sol-gel method
2007年
The Bi4Zr0.5Ti2.5O12 (BZT) thin films were fabricated on the LaNiO3 bottom electrode using sol-gel method. The structure and morphology of the films were character-ized using X-ray diffraction, AFM and SEM. The results show that the films have a perovskite phase and dense microstructure. The 2Pr and 2Vc of the Pt/BZT/LaNiO3 capacitor are 28.2 μC/cm2 and 14.7 V respectively at an applied voltage of 25 V. After the switching of 1×1010 cycles, the Pr value decreases to 87% of its pre-fatigue val-ues. The dielectric constant (ε) and the dissipation factor (tanδ) of the BZT thin films are about 204 and 0.029 at 1 kHz, respectively. The films show good insulating behavior according to the test of leakage current. The clockwise C-V hysteresis curve observed shows that the Pt/BZT/LaNiO3 structure has a memory effect be-cause of the BZT film’s ferroelectric polarization.
GUO DongYun1, LI MeiYa1, LIU Jun1, PEI Ling1, YU BenFang1, ZHAO XingZhong1, YANG Bin2, WANG YunBo2 & YU Jun2 1 Department of Physics, Wuhan University, Wuhan 430072, China
Ferroelectric properties of Bi_(3.25)La_(0.75)Ti_(3)O_(12) thin films prepared by sol-gel method被引量:4
2007年
The Bi3.25La0.75Ti3O12 thin films were fabricated on the Pt/Ti/SiO2/Si substrates using sol-gel method. The structure and morphology of the films were characterized us-ing X-ray diffraction and atomic force microscopy. The thin films showed a perov- skite phase and dense microstructure. The 2Pr and 2Vc of the Bi3.25La0.75Ti3O12 thin films annealed at 700℃ were 18.6 μC/cm2 and 4.1 V, respectively, under an applied voltage 10 V. After the switching of 1×1010 cycles, the Pr value decreased to 90% of its pre-fatigue values. The films showed good insulating behavior according to the test of leakage current. The dielectric constant and the dissipation factor of the Bi3.25La0.75Ti3O12 thin films were about 176 and 0.046 at 1 kHz, respectively.
GUO DongYun1, LI MeiYa1, PEI Ling1, YU BenFang1, WU GengZhu1, ZHAO XingZhong1, WANG YunBo2 & YU Jun2 1 Department of Physics, Wuhan University, Wuhan 430072, China
关键词:THINSOL-GELFERROELECTRICFATIGUELEAKAGE
Nd掺杂的Bi_4Ti_3O_(12)变温X射线衍射分析被引量:2
2007年
利用变温X射线衍射技术,在预烧过程中分析了Nd掺杂Bi4Ti3O12后生成Bi3.15Nd0.85Ti3O12(BNT)相的形成过程以及微结构的变化.实验观察到以30℃/min的升温速率,BNT相在700℃时开始形成,其衍射峰强度随温度的继续升高而增强,衍射峰半高宽随烧结时间延长而减小.X射线衍射分析结果表明,在900℃恒温条件下,烧结约2h,可形成单一的BNT相.
徐文广李美亚李少珍
关键词:结构相变
LaNiO_3底电极上Bi_4Zr_(0.5)Ti_(2.5)O_(12)薄膜的制备及性能
2007年
利用Sol-gel法在p-Si(111)衬底上制备了LaNiO3底电极,再利用Sol-gel法在LaNiO3底电极上制备出Bi4Zr0.5Ti2.5O12(BZT)铁电薄膜,对其微观结构和电学性能进行了研究.利用X射线衍射仪、原子力显微镜和扫描电镜观测其微观结构,发现制备的BZT薄膜具有单一的钙钛矿晶格结构,并且薄膜表面晶粒尺寸均匀,结晶情况良好.对Pt/BZT/LaNiO3电容结构进行了铁电性能研究,在测试电压为25V时,2Pr和2Vc分别达到28.2μC/cm2和14.7V;经过1×1010次极化反转后,剩余极化值下降了大约13/;室温下,在测试频率1kHz时,薄膜的介电常数为204,介电损耗为0.029;漏电流测试显示制备的BZT薄膜具有良好的绝缘性能;C-V曲线为顺时针方向回滞,存储窗口大约为3.0V,C-V特性测试显示这种Pt/BZT/LaNiO3结构有望实现极化型存储.
郭冬云李美亚刘军裴玲于本方赵兴中杨斌王耘波于军
关键词:SOL-GEL法铁电性能
Sol-gel法制备Bi3.4Ce0.6Ti3O12铁电薄膜及其性能被引量:1
2008年
采用Sol-gel法在Pt/Ti/SiO2/Si衬底上制备Bi3.4Ce0.6Ti3O12薄膜.利用X射线衍射仪和原子力显微镜对其微观结构进行了观察,发现制备的薄膜具有单一的钙钛矿晶格结构,而且表面平整致密.对Bi3.4Ce0.6Ti3O12薄膜的介电、铁电、疲劳和漏电流等性能进行了研究,结果表明:室温下,在测试频率1 kHz时,其介电常数为172,介电损耗为0.031;在测试电压为600 kV·cm-1,其剩余极化值2Pr达到了67.1μC·cm-2,具有较大的剩余极化值,矫顽场强2Ec也达到了299.7kV·cm-1;经过4.46×109次极化反转后,没有发生疲劳现象,表现出良好的抗疲劳特性;漏电流测试显示制备的Bi3.4Ce0.6Ti3O12薄膜具有良好的绝缘性能.
郭冬云李美亚刘军于本方裴玲于军王耘波杨兵
关键词:铁电性能介电性能
La掺杂的Bi_4Ti_3O_(12)陶瓷的动态变温X射线衍射研究被引量:1
2005年
利用动态变温X射线衍射技术,研究了La掺杂Bi4Ti3O12(BLT)陶瓷相的形成过程、微结构的变化及其与温度的关系。动态跟踪比较了不同物相的反应速率与消长规律。比较了大气与真空不同的气氛环境对BLT相结构形成的影响。初步给出了固态成相的温度范围和所需时间。
李美亚李少珍徐文广吴庚柱赵兴中
关键词:X射线衍射结构相变
Microstructures and fatigue-free properties of the La^(3+) and Nd^(3+) doped Bi_4Ti_3O_(12) thin films prepared by modified sol-gel technique
2008年
Ferroelectric Bi3.25La0.75Ti3O12 (BLT) and Bi3.15Nd0.85Ti3O12 (BNT) thin films were fab- ricated on Pt/TiO2/SiO2/Si (100) substrates by a modified sol-gel technique. X-ray diffraction indicated that these films were of single phase with random polycrystal- line orientations. The surface morphologies of the films were observed by scanning electron microscope, showing uniform, dense films with grain size of 50―100 nm. Well-saturated hysteresis loops of the films were obtained in metal-ferroelectric- metal type capacitors with Cu top electrodes at an applied voltage of 400 kV/cm, giving the remanent polarization (2Pr) and coercive field (2Ec) values of the films of 25.1 μC/cm2 and 203 kV/cm for BLT, and 44.2 μC/cm2 and 296 kV/cm for BNT, re- spectively. Moreover, these capacitors did not show fatigue behaviors after up to 1.75×1010 switching cycles at the test frequency of 1 MHz, suggesting a fatigue-free character. The influences of the La3+ and Nd3+ doping on the properties of the films were comparatively discussed.
LI MeiYa1,2, PEI Ling1, LIU Jun1, YU BenFang1, GUO DongYun1, SUN XiaoHua3 & ZHAO XingZhong1,2 1 Department of Electronic Science and Technology, School of Physical Science and Technology, Wuhan University, Wuhan 430072, China
关键词:BISMUTHOXIDESFERROELECTRICSTECHNIQUE
La和Nd掺杂的硅基Bi_4Ti_3O_(12)铁电薄膜的无疲劳特性及其机理的比较研究被引量:1
2009年
采用优化的溶胶-凝胶(Sol—gel)技术,同一工艺条件下在Pt/TiO2/SiO2/Si衬底上成功地制备了Bi3.25La0.75Ti3O12(BLT)和Bi3.15Nd0.85Ti3O12(BNT)铁电薄膜.X射线衍射(XRD)测试表明BLT和BNT薄膜具有单相的取向随机的多晶微结构;扫描电镜(SEM)的观测显示了这些薄膜具有50~100nm晶粒构成的均匀致密的表面形貌.利用铁电测试仪测定了以Cu为上电极而形成的金属-铁电薄膜-金属结构的电容器的铁电性能,得到了很好的饱和电滞回线.在最大外加场强为400kV/cm时,BLT和BNT薄膜的剩余极化强度(2Pr)和矫顽电场(2Ee)分别为25.1gC/cm^2,203kV/cm和44.2gC/cm^2,296kV/cm.疲劳测试表明,在1MHz频率测试下经过1.75×10^10次读写循环后,由BLT和BNT薄膜组成的电容器几乎没有表现出疲劳,呈现很好的抗疲劳特性.分析比较了La和Nd掺杂对薄膜结构及铁电性能的影响及其机理.
李美亚裴玲刘军于本方郭冬云孙小华赵兴中
关键词:BLTBNT铁电性质溶胶-凝胶技术
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